Alternative lithographic technologies III (1-3 March 2011, San Jose, California, United States)Herr, Daniel J. C.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 1 vol, isbn 978-0-8194-8529-8Conference Proceedings

Development and characterization of carbon nanotube processes for NRAM technologyAMBLARD, Gilles.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797017.1-797017.7Conference Paper

Nanoimprint Lithography for Semiconductor Devices and Future Patterning InnovationHIGASHIKI, Tatsuhiko; NAKASUGI, Tetsuro; YONEDA, Ikuo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797003.1-797003.6Conference Paper

Soft UV-NIL at the 12.5 nm ScaleKREINDL, G; KAST, M; BERGMAIR, I et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701M.1-79701M.7Conference Paper

The comparison of NGLs from a tool vendor's viewSUZUKI, Akiyoshi.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797005.1-797005.12Conference Paper

Progress in Mask Replication using Jet and Flash Imprint LithographySELINIDIS, Kosta S; BROOKS, Cynthia B; DOYLE, Gary F et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797009.1-797009.11Conference Paper

eMET: 50keV electron multibeam Mask Exposure ToolKLEIN, Christof; KLIKOVITS, Jan; LOESCHNER, Hans et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700C.1-79700C.6Conference Paper

E-Beam to Complement Optical Lithography for 1D LayoutsLAM, David K; LIU, Enden D; SMAYLING, Michael C et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797011.1-797011.8Conference Paper

Fast Mask Writers: Technology Options and ConsiderationsLITT, Lloyd C; GROVES, Timothy.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700X.1-79700X.9Conference Paper

Optimization of e-beam landing energy for EBDWLIU, Enden D; PRESCOP, Ted.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701S.1-79701S.10Conference Paper

Reactive Fluorinated Surfactant for Step and Flash Imprint LithographyOGAWA, Tsuyoshi; HELLEBUSCH, Daniel J; LIN, Michael W et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700T.1-79700T.7Conference Paper

Fast and large-field electron-beam exposure by CSELKOJIMA, A; OHTA, T; OHYI, H et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701R.1-79701R.10Conference Paper

Scatterometry Sensitivity for NIL ProcessMIYAKAWA, Takahiro; SATO, Kazuhiro; SENTOKU, Koich et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701N.1-79701N.7Conference Paper

Scanning exposures with a MAPPER multibeam systemVAN DEN BERG, C; DE BOER, G; VAN MIL, I. L et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700D.1-79700D.9Conference Paper

IMAGINE: an open consortium to boost maskless lithography take off First assessment results on MAPPER technologyPAIN, L; ICARD, B; MARTIN, M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700Y.1-79700Y.11Conference Paper

Wafer-level fabrication of distributed feedback laser diodes by utilizing UV nanoimprint lithographyYANAGISAWA, Masaki; TSUJI, Yukihiro; YOSHINAGA, Hiroyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797014.1-797014.8Conference Paper

A new releasing material and continuous nano-imprinting in mold replication for patterned mediaSUZUKI, Kouta; KOBAYASHI, Hideo; SATO, Takashi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700U.1-79700U.6Conference Paper

Adaptation of Roll-to-Roll Imprint Lithography: From Flexible Electronics to Structural TemplatesHOLLAND, Edward R; JEANS, Albert; PING MEI et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797016.1-797016.11Conference Paper

Defect Reduction of High-Density Full-Field Patterns in Jet and Flash Imprint LithographySINGH, Lovejeet; KANG LUO; ZHENGMAO YE et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797007.1-797007.8Conference Paper

Demonstration of Lithography Patterns using Reflective E-beam Direct WriteFREED, Regina; SUN, Jeff; BRODIE, Alan et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701T.1-79701T.12Conference Paper

EBPC for multi-beams low kV electron projection lithographyBELLEDENT, Jérôme; SOULAN, Sébastien; PAIN, Laurent et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701B.1-79701B.10Conference Paper

Nanopatterning of diblock copolymer directed self-assembly lithography with wet developmentMURAMATSU, Makoto; IWASHITA, Mitsuaki; KITANO, Takahiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701F.1-79701F.7Conference Paper

Self-Assembly Patterning for sub-15nm Half-Pitch: A Transition from Lab to FabBENCHER, Chris; SMITH, Jeffrey; HINSBERG, William D et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700F.1-79700F.9Conference Paper

Solid-immersion Lloyd's Mirror as a Testbed for Plasmon-enhanced High-NA LithographyMEHROTRA, Prateek; HOLZWARTH, Charles W; BLAIKIE, Richard J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701L.1-79701L.12Conference Paper

Tunable two-mirror laser interference lithography system for large-area nano-patterningWEIDONG MAO; WATHUTHANTHRI, Ishan; CHOI, Chang-Hwan et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701K.1-79701K.8Conference Paper